Publications from Facility Staff
2012 |2011 |2010-2009 | 2008-2004
Fluoroalkyl-modified homopolymer (FA-polymer) additives promote mold release and self-assembly in block copolymer thin films during thermal nanoimprint processes. Subsequent lithographic steps reveal underlying equilibrium phase segregated morphologies, which show a high degree of graphoepitaxial alignment with the mold features over the imprinted area.
- C. Peroz, S. Dhuey, M. Cornet, M. Vogler, D. Olynick and S. Cabrini, "Single digit nanofabrication by step-and-repeat nanoimprint lithography," Nanotechnology 23, 015305 (2012). [pdf]
